Diagnostics of Fluorine Negative Ions by Laser Photodetachment Combined with a Heated Probe in High-Density CF 4 Plasmas
This paper reports the absolute density and reaction kinetics of fluorine negative ions (F - ) in a low-pressure, high-density CF 4 plasma excited by helicon-wave discharge. Probe-assisted laser photodetachment has been adopted for the measurement of the F - density. To avoid the deposition of insul...
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Veröffentlicht in: | Japanese Journal of Applied Physics 1997-12, Vol.36 (12B), p.L1702 |
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Hauptverfasser: | , , , |
Format: | Artikel |
Sprache: | eng |
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Zusammenfassung: | This paper reports the absolute density and reaction kinetics of fluorine negative ions (F
-
) in a low-pressure, high-density CF
4
plasma excited by helicon-wave discharge. Probe-assisted laser photodetachment has been adopted for the measurement of the F
-
density. To avoid the deposition of insulated fluorocarbon films on the probe surface, the probe tip was heated to approximately 1000 K. For a CF
4
gas pressure of 2 mTorr, the ratio of the F
-
density to the electron density was
n
-
/
n
e
≃0.06 in the active discharge plasma with a plasma density of 1.8 ×10
12
cm
-3
. In the afterglow, the electron density decreased rapidly with a decay time constant of ≃10 µs, while the F
-
density had a peak at ∼15 µs after the termination of the rf power. The ratio
n
-
/
n
e
increased up to ∼5.7 in the afterglow. The production and loss processes of F
-
are discussed based on the experimental observations. |
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ISSN: | 0021-4922 1347-4065 |
DOI: | 10.1143/JJAP.36.L1702 |