Anisotropic Resistivity of In-Plane-Aligned La 2-x Sr x CuO 4 (100) Films on LaSrGaO 4 (100) Substrates

We prepared in-plane-aligned La 2- x Sr x CuO 4 (100) films using LaSrGaO 4 (100) substrates by KrF laser ablation. The φ scan of X-ray diffraction and the large anisotropy of resistivity indicate a high degree of in-plane epitaxy. The T c of the in-plane-aligned La 2- x Sr x CuO 4 ( x =0.15) was 21...

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Veröffentlicht in:Japanese Journal of Applied Physics 1997-05, Vol.36 (5R), p.2642
Hauptverfasser: Hiroaki Myoren, Hiroaki Myoren, Roger Bergs, Roger Bergs, Takashi Tachiki, Takashi Tachiki, Jian Chen, Jian Chen, Kensuke Nakajima, Kensuke Nakajima, Mitsumasa Suzuki, Mitsumasa Suzuki, Tsutomu Yamashita, Tsutomu Yamashita, Hisashi Sato, Hisashi Sato, Michio Naito, Michio Naito
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Sprache:eng
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Zusammenfassung:We prepared in-plane-aligned La 2- x Sr x CuO 4 (100) films using LaSrGaO 4 (100) substrates by KrF laser ablation. The φ scan of X-ray diffraction and the large anisotropy of resistivity indicate a high degree of in-plane epitaxy. The T c of the in-plane-aligned La 2- x Sr x CuO 4 ( x =0.15) was 21.6 K. The critical temperatures measured along the c -axis were usually higher than those measured along the a -axis. We also observed voltage peaks at just above T c , corresponding to the abrupt decrease of the anisotropy of resistivity at T c .
ISSN:0021-4922
1347-4065
DOI:10.1143/JJAP.36.2642