Anisotropic Resistivity of In-Plane-Aligned La 2-x Sr x CuO 4 (100) Films on LaSrGaO 4 (100) Substrates
We prepared in-plane-aligned La 2- x Sr x CuO 4 (100) films using LaSrGaO 4 (100) substrates by KrF laser ablation. The φ scan of X-ray diffraction and the large anisotropy of resistivity indicate a high degree of in-plane epitaxy. The T c of the in-plane-aligned La 2- x Sr x CuO 4 ( x =0.15) was 21...
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Veröffentlicht in: | Japanese Journal of Applied Physics 1997-05, Vol.36 (5R), p.2642 |
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Hauptverfasser: | , , , , , , , , |
Format: | Artikel |
Sprache: | eng |
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Zusammenfassung: | We prepared in-plane-aligned La
2-
x
Sr
x
CuO
4
(100) films using LaSrGaO
4
(100) substrates by KrF laser ablation. The φ scan of X-ray diffraction and the large anisotropy of resistivity indicate a high degree of in-plane epitaxy. The
T
c
of the in-plane-aligned La
2-
x
Sr
x
CuO
4
(
x
=0.15) was 21.6 K. The critical temperatures measured along the
c
-axis were usually higher than those measured along the
a
-axis. We also observed voltage peaks at just above
T
c
, corresponding to the abrupt decrease of the anisotropy of resistivity at
T
c
. |
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ISSN: | 0021-4922 1347-4065 |
DOI: | 10.1143/JJAP.36.2642 |