Selective dry etching to reveal compositional inhomogeneity in Co-Cr magnetic films

We studied a selective dry-etching method designed to reveal compositional inhomogeneity in Co–Cr alloy magnetic films. The dry etching was carried out using reactive sputtering with CO 2 as the working gas. Preferential etching of Co was confirmed by depth profiling using Auger electron spectroscop...

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Veröffentlicht in:	Japanese Journal of Applied Physics 1996, Vol.35 (4A), p.2149-2150
Hauptverfasser:	ASAHI, M, TAKEI, K, MAEDA, Y
Format:	Artikel
Sprache:	eng
Schlagworte:	Applied sciences Composition and phase identification Condensed matter: structure, mechanical and thermal properties Exact sciences and technology Metals. Metallurgy Physics Surfaces and interfaces thin films and whiskers (structure and nonelectronic properties) Thin film structure and morphology
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Beschreibung
Zusammenfassung:	We studied a selective dry-etching method designed to reveal compositional inhomogeneity in Co–Cr alloy magnetic films. The dry etching was carried out using reactive sputtering with CO 2 as the working gas. Preferential etching of Co was confirmed by depth profiling using Auger electron spectroscopy. The compositional microstructure revealed by the dry etching was observed using scanning electron microscopy.
ISSN:	0021-4922 1347-4065
DOI:	10.1143/jjap.35.2149