The SCattering with Angular Limitation in Projection Electron-beam Lithography (SCALPEL) system
A SCALPEL \circledR (SCattering with Angular Limitation in Projection Electron-beam Lithography) proof-of-concept lithography system, comprising a tool, a reticle and a resist, has been designed to address the critical issues that must be investigated to determine if this approach is viable as a pra...
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Veröffentlicht in: | Japanese Journal of Applied Physics 1995-12, Vol.34 (12B), p.6663-6671 |
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Hauptverfasser: | , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , |
Format: | Artikel |
Sprache: | eng |
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Online-Zugang: | Volltext |
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Zusammenfassung: | A SCALPEL
\circledR
(SCattering with Angular Limitation in Projection Electron-beam Lithography) proof-of-concept lithography system, comprising a tool, a reticle and a resist, has been designed to address the critical issues that must be investigated to determine if this approach is viable as a practical lithographic technology. |
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ISSN: | 0021-4922 1347-4065 |
DOI: | 10.1143/jjap.34.6663 |