The SCattering with Angular Limitation in Projection Electron-beam Lithography (SCALPEL) system

A SCALPEL \circledR (SCattering with Angular Limitation in Projection Electron-beam Lithography) proof-of-concept lithography system, comprising a tool, a reticle and a resist, has been designed to address the critical issues that must be investigated to determine if this approach is viable as a pra...

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Veröffentlicht in:Japanese Journal of Applied Physics 1995-12, Vol.34 (12B), p.6663-6671
Hauptverfasser: LIDDLE, J. A, BERGER, S. D, CUSTY, J, FARROW, R. C, FELKER, J. A, FETTER, L. A, FREEMAN, B, HARRIOTT, L. R, HOPKINS, L.L, HUGGINS, H. A, KNUREK, C. S, KRAUS, J. S, BIDDICK, C. J, MIXON, D. A, MKRTCHYAN, M. M, NOVEMBRE, A. E, PEABODY, M. L, SIMPSON, W. M, TARASCON, R. G, WADE, H. H, WASKIEWICZ, W. K, WATSON, G. P, WILLIAMS, J. K, BLAKEY, M. I, WINDT, D. L, BOLAN, BOWLER, S. W, BRADY, K, CAMARDA, R. M, CONNELLY, W. F, CHORKEN, A
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Sprache:eng
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Zusammenfassung:A SCALPEL \circledR (SCattering with Angular Limitation in Projection Electron-beam Lithography) proof-of-concept lithography system, comprising a tool, a reticle and a resist, has been designed to address the critical issues that must be investigated to determine if this approach is viable as a practical lithographic technology.
ISSN:0021-4922
1347-4065
DOI:10.1143/jjap.34.6663