Wafer Treatment Using Electrolysis-Ionized Water
Electrolysis-ionized water treatment is shown to be useful for removing polystyrene particles from contact holes, silicon surface cleaning and the removal of metal contamination such as copper. Electrolysis-ionized water has a controllable pH and a higher oxidation-reduction potential than chemicals...
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| Veröffentlicht in: | Japanese Journal of Applied Physics 1994-10, Vol.33 (10R), p.5686 |
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| Sprache: | eng |
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| container_issue | 10R |
| container_start_page | 5686 |
| container_title | Japanese Journal of Applied Physics |
| container_volume | 33 |
| creator | Aoki, Hidemitsu Nakamori, Masaharu Nahomi Aoto, Nahomi Aoto Eiji Ikawa, Eiji Ikawa |
| description | Electrolysis-ionized water treatment is shown to be useful for removing polystyrene
particles from contact holes, silicon surface cleaning and the removal of metal contamination
such as copper. Electrolysis-ionized water
has a controllable pH and a higher oxidation-reduction potential than chemicals. Moreover, this water does not
contain acid or alkaline chemicals, and can easily be neutralized without adding chemicals.
Electrolysis-ionized water treatment has great potential for ecologically safe and low cost semiconductor processing. |
| doi_str_mv | 10.1143/JJAP.33.5686 |
| format | Article |
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particles from contact holes, silicon surface cleaning and the removal of metal contamination
such as copper. Electrolysis-ionized water
has a controllable pH and a higher oxidation-reduction potential than chemicals. Moreover, this water does not
contain acid or alkaline chemicals, and can easily be neutralized without adding chemicals.
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particles from contact holes, silicon surface cleaning and the removal of metal contamination
such as copper. Electrolysis-ionized water
has a controllable pH and a higher oxidation-reduction potential than chemicals. Moreover, this water does not
contain acid or alkaline chemicals, and can easily be neutralized without adding chemicals.
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particles from contact holes, silicon surface cleaning and the removal of metal contamination
such as copper. Electrolysis-ionized water
has a controllable pH and a higher oxidation-reduction potential than chemicals. Moreover, this water does not
contain acid or alkaline chemicals, and can easily be neutralized without adding chemicals.
Electrolysis-ionized water treatment has great potential for ecologically safe and low cost semiconductor processing.</abstract><doi>10.1143/JJAP.33.5686</doi></addata></record> |
| fulltext | fulltext |
| identifier | ISSN: 0021-4922 |
| ispartof | Japanese Journal of Applied Physics, 1994-10, Vol.33 (10R), p.5686 |
| issn | 0021-4922 1347-4065 |
| language | eng |
| recordid | cdi_crossref_primary_10_1143_JJAP_33_5686 |
| source | IOP Publishing Journals; Institute of Physics (IOP) Journals - HEAL-Link |
| title | Wafer Treatment Using Electrolysis-Ionized Water |
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