Wafer Treatment Using Electrolysis-Ionized Water

Electrolysis-ionized water treatment is shown to be useful for removing polystyrene particles from contact holes, silicon surface cleaning and the removal of metal contamination such as copper. Electrolysis-ionized water has a controllable pH and a higher oxidation-reduction potential than chemicals...

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Veröffentlicht in:Japanese Journal of Applied Physics 1994-10, Vol.33 (10R), p.5686
Hauptverfasser: Aoki, Hidemitsu, Nakamori, Masaharu, Nahomi Aoto, Nahomi Aoto, Eiji Ikawa, Eiji Ikawa
Format: Artikel
Sprache:eng
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Zusammenfassung:Electrolysis-ionized water treatment is shown to be useful for removing polystyrene particles from contact holes, silicon surface cleaning and the removal of metal contamination such as copper. Electrolysis-ionized water has a controllable pH and a higher oxidation-reduction potential than chemicals. Moreover, this water does not contain acid or alkaline chemicals, and can easily be neutralized without adding chemicals. Electrolysis-ionized water treatment has great potential for ecologically safe and low cost semiconductor processing.
ISSN:0021-4922
1347-4065
DOI:10.1143/JJAP.33.5686