Wafer Treatment Using Electrolysis-Ionized Water
Electrolysis-ionized water treatment is shown to be useful for removing polystyrene particles from contact holes, silicon surface cleaning and the removal of metal contamination such as copper. Electrolysis-ionized water has a controllable pH and a higher oxidation-reduction potential than chemicals...
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Veröffentlicht in: | Japanese Journal of Applied Physics 1994-10, Vol.33 (10R), p.5686 |
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Hauptverfasser: | , , , |
Format: | Artikel |
Sprache: | eng |
Online-Zugang: | Volltext |
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Zusammenfassung: | Electrolysis-ionized water treatment is shown to be useful for removing polystyrene
particles from contact holes, silicon surface cleaning and the removal of metal contamination
such as copper. Electrolysis-ionized water
has a controllable pH and a higher oxidation-reduction potential than chemicals. Moreover, this water does not
contain acid or alkaline chemicals, and can easily be neutralized without adding chemicals.
Electrolysis-ionized water treatment has great potential for ecologically safe and low cost semiconductor processing. |
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ISSN: | 0021-4922 1347-4065 |
DOI: | 10.1143/JJAP.33.5686 |