NaCl-type oxide films prepared by plasma-enhanced metalorganic chemical vapor deposition
Thin films of MgO, NiO and CoO with NaCl-type structure were prepared by plasma-enhanced metalorganic chemical vapor deposition using metal acetylacetonato complexes as source materials. Soda-lime glass, Si(111), stainless steel and fused silica were used as the substrates. X-ray diffraction pattern...
Gespeichert in:
Veröffentlicht in: | Japanese Journal of Applied Physics 1993-10, Vol.32 (10A), p.L1448-L1450 |
---|---|
Hauptverfasser: | , , , , , |
Format: | Artikel |
Sprache: | eng |
Schlagworte: | |
Online-Zugang: | Volltext |
Tags: |
Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
|
Zusammenfassung: | Thin films of MgO, NiO and CoO with NaCl-type structure were prepared by plasma-enhanced metalorganic chemical vapor deposition using metal acetylacetonato complexes as source materials. Soda-lime glass, Si(111), stainless steel and fused silica were used as the substrates. X-ray diffraction patterns indicated that (100) preferred-orientation NaCl-type oxide films were obtained at substrate temperatures of 150°C or above, independent of the kind of substrate. Scanning electron microscopy images showed that each film had a smooth surface and a columnar structure with growth perpendicular to the film surface. |
---|---|
ISSN: | 0021-4922 1347-4065 |
DOI: | 10.1143/jjap.32.l1448 |