NaCl-type oxide films prepared by plasma-enhanced metalorganic chemical vapor deposition

Thin films of MgO, NiO and CoO with NaCl-type structure were prepared by plasma-enhanced metalorganic chemical vapor deposition using metal acetylacetonato complexes as source materials. Soda-lime glass, Si(111), stainless steel and fused silica were used as the substrates. X-ray diffraction pattern...

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Veröffentlicht in:Japanese Journal of Applied Physics 1993-10, Vol.32 (10A), p.L1448-L1450
Hauptverfasser: FUJII, E, TOMOZAWA, A, FUJII, S, TORII, H, HATTORI, M, TAKAYAMA, R
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Sprache:eng
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Zusammenfassung:Thin films of MgO, NiO and CoO with NaCl-type structure were prepared by plasma-enhanced metalorganic chemical vapor deposition using metal acetylacetonato complexes as source materials. Soda-lime glass, Si(111), stainless steel and fused silica were used as the substrates. X-ray diffraction patterns indicated that (100) preferred-orientation NaCl-type oxide films were obtained at substrate temperatures of 150°C or above, independent of the kind of substrate. Scanning electron microscopy images showed that each film had a smooth surface and a columnar structure with growth perpendicular to the film surface.
ISSN:0021-4922
1347-4065
DOI:10.1143/jjap.32.l1448