Micro-Patterning of PbZr x Ti 1-x O 3 Thin Films Prepared by Photo Sensitive Sol-Gel Solution
The photo sensitivity of sol-gel solution of PbZr x Ti 1- x O 3 (PZT) was studied. A coated film of the sol-gel solution on Pt/Ti/SiO 2 /Si substrates was exposed to an excimer laser and developed with water. The film was finally annealed at 700°C for 60 s by rapid thermal annealing (RTA). Ferroelec...
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Veröffentlicht in: | Japanese Journal of Applied Physics 1993-09, Vol.32 (9S), p.4141 |
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Hauptverfasser: | , , , , , , , |
Format: | Artikel |
Sprache: | eng |
Online-Zugang: | Volltext |
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Zusammenfassung: | The photo sensitivity of sol-gel solution of PbZr
x
Ti
1-
x
O
3
(PZT) was studied. A coated film of the sol-gel solution on Pt/Ti/SiO
2
/Si substrates was exposed to an excimer laser and developed with water. The film was finally annealed at 700°C for 60 s by rapid thermal annealing (RTA). Ferroelectric perovskite phase was observed in the PZT thin films. The 130-nm-thick film showed
P
r
of 11.2 µ C/cm
2
and
E
c
of 93.8 kV/cm. From this process, half-micron patterns of PZT films were obtained. |
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ISSN: | 0021-4922 1347-4065 |
DOI: | 10.1143/JJAP.32.4141 |