34 GHz bandwidth GaAs high-speed Schottky barrier photodiode fabricated by chemical-beam epitaxy

A high-speed, high-sensitivity GaAs Schottky barrier photodiode grown by chemical-beam epitaxy (CBE) has been designed, fabricated, and characterized. Antireflection coatings utilizing Si and SiO 2 films were optimally used to minimize reflection loss, thereby significantly improving sensitivity of...

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Veröffentlicht in:Japanese Journal of Applied Physics 1992-02, Vol.31 (2B), p.L180-L182
Hauptverfasser: SEKIGUCHI, Y, KUWAHARA, T, KOBAYASHI, F, IIO, S
Format: Artikel
Sprache:eng
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Zusammenfassung:A high-speed, high-sensitivity GaAs Schottky barrier photodiode grown by chemical-beam epitaxy (CBE) has been designed, fabricated, and characterized. Antireflection coatings utilizing Si and SiO 2 films were optimally used to minimize reflection loss, thereby significantly improving sensitivity of the Schottky barrier photodiode. This device has a -3 dB cutoff frequency of 34 GHz, determined by an optical heterodyne technique, an external quantum efficiency of 41% at 780 nm wavelength, and a dark current of 100 pA ( V R =-2 V).
ISSN:0021-4922
1347-4065
DOI:10.1143/jjap.31.l180