34 GHz bandwidth GaAs high-speed Schottky barrier photodiode fabricated by chemical-beam epitaxy
A high-speed, high-sensitivity GaAs Schottky barrier photodiode grown by chemical-beam epitaxy (CBE) has been designed, fabricated, and characterized. Antireflection coatings utilizing Si and SiO 2 films were optimally used to minimize reflection loss, thereby significantly improving sensitivity of...
Gespeichert in:
Veröffentlicht in: | Japanese Journal of Applied Physics 1992-02, Vol.31 (2B), p.L180-L182 |
---|---|
Hauptverfasser: | , , , |
Format: | Artikel |
Sprache: | eng |
Schlagworte: | |
Online-Zugang: | Volltext |
Tags: |
Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
|
Zusammenfassung: | A high-speed, high-sensitivity GaAs Schottky barrier photodiode grown by chemical-beam epitaxy (CBE) has been designed, fabricated, and characterized. Antireflection coatings utilizing Si and SiO
2
films were optimally used to minimize reflection loss, thereby significantly improving sensitivity of the Schottky barrier photodiode. This device has a -3 dB cutoff frequency of 34 GHz, determined by an optical heterodyne technique, an external quantum efficiency of 41% at 780 nm wavelength, and a dark current of 100 pA (
V
R
=-2 V). |
---|---|
ISSN: | 0021-4922 1347-4065 |
DOI: | 10.1143/jjap.31.l180 |