Thermal chemical vapor deposition of diamond from methane-hydrogen gas system pyrolized at low temperature (1450°C)

Thermal chemical vapor deposition (CVD) of diamond using a nozzle or a plate heated at much lower temperature than a conventional hot filament CVD was reported. The lowest temperature achieved for the pyrolysis of the material gas was 1450°C for the methane-hydrogen mixture system. The gas-phase chemistry was then discussed in relation to both the experimentation and the corresponding numerical simulation.