CuCl Microcrystallite-Doped SiO 2 Glass Thin Films Prepared by RF Sputtering
CuCl microcrystallites were successfully doped into SiO 2 glass thin films by means of the magnetron rf-sputtering technique. A transmission electron microscopy (TEM) measurement showed that the microcrystallites had a spherical configuration. The average size of the microcrystallites was less than...
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Veröffentlicht in: | Japanese Journal of Applied Physics 1991-04, Vol.30 (4B), p.L764 |
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Hauptverfasser: | , , , , |
Format: | Artikel |
Sprache: | eng |
Online-Zugang: | Volltext |
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Zusammenfassung: | CuCl microcrystallites were successfully doped into SiO
2
glass thin films by means of the magnetron rf-sputtering technique. A transmission electron microscopy (TEM) measurement showed that the microcrystallites had a spherical configuration. The average size of the microcrystallites was less than 5 nm and it was affected by the preparation condition and postdeposition annealing time. Optical absorption peaks corresponding to Z
3
and Z
1,2
exciton were observed. These absorption lines shifted to a higher-energy side with decreasing microcrystallite size. This phenomenon seems to relate to the quantum size effect. |
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ISSN: | 0021-4922 1347-4065 |
DOI: | 10.1143/JJAP.30.L764 |