CuCl Microcrystallite-Doped SiO 2 Glass Thin Films Prepared by RF Sputtering

CuCl microcrystallites were successfully doped into SiO 2 glass thin films by means of the magnetron rf-sputtering technique. A transmission electron microscopy (TEM) measurement showed that the microcrystallites had a spherical configuration. The average size of the microcrystallites was less than...

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Veröffentlicht in:Japanese Journal of Applied Physics 1991-04, Vol.30 (4B), p.L764
Hauptverfasser: Tsunetomo, Keiji, Shimizu, Ryuichiro, Kawabuchi, Akira, Hayuyuki Kitayama, Hayuyuki Kitayama, Yukio Osaka, Yukio Osaka
Format: Artikel
Sprache:eng
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Zusammenfassung:CuCl microcrystallites were successfully doped into SiO 2 glass thin films by means of the magnetron rf-sputtering technique. A transmission electron microscopy (TEM) measurement showed that the microcrystallites had a spherical configuration. The average size of the microcrystallites was less than 5 nm and it was affected by the preparation condition and postdeposition annealing time. Optical absorption peaks corresponding to Z 3 and Z 1,2 exciton were observed. These absorption lines shifted to a higher-energy side with decreasing microcrystallite size. This phenomenon seems to relate to the quantum size effect.
ISSN:0021-4922
1347-4065
DOI:10.1143/JJAP.30.L764