Highly efficient, large-area polycrystalline silicon solar cells fabricated using hydrogen passivation technology
Highly efficient, large area polycrystalline silicon solar cells have been fabricated using ion implantation as a hydrogen passivation technique. A new high-current ion implanter with a bucket-type ion source has been developed to hydrogenate crystal defects in cast polycrystalline cells. Effective...
Gespeichert in:
Veröffentlicht in: | Japanese Journal of Applied Physics 1989-02, Vol.28 (2), p.167-173 |
---|---|
Hauptverfasser: | , , , , , , , , , |
Format: | Artikel |
Sprache: | eng |
Schlagworte: | |
Online-Zugang: | Volltext |
Tags: |
Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
|
Zusammenfassung: | Highly efficient, large area polycrystalline silicon solar cells have been fabricated using ion implantation as a hydrogen passivation technique. A new high-current ion implanter with a bucket-type ion source has been developed to hydrogenate crystal defects in cast polycrystalline cells. Effective hydrogen passivation of the defects has been realized by implanting hydrogen ions into cast cells from the back surfaces and increasing the hydrogen ion energy and dose. A scanning light beam-induced current image of the polycrystalline cells shows that lowering of the induced current distribution at linear grain boundaries is almost completely eliminated, but not at irregular grain boundaries. The resultant polycrystalline cells exhibit a high conversion efficiency of 15.2% for a large area of 100 cm
2
. |
---|---|
ISSN: | 0021-4922 1347-4065 |
DOI: | 10.1143/jjap.28.167 |