Characteristics of the hydrogenated amorphous silicon-crystalline cadmium telluride heterojunction diode
The current-voltage characteristics and visible and X-ray photocurrent characteristics have been investigated for a heterojunction diode constructed of plasma-deposited hydrogenated amorphous silicon (a-Si:H) and single crystal cadmium telluride (c-CdTe). Devices showed low reverse bias saturation c...
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Veröffentlicht in: | Japanese Journal of Applied Physics 1987-11, Vol.26 (11), p.L1812-L1814 |
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container_issue | 11 |
container_start_page | L1812 |
container_title | Japanese Journal of Applied Physics |
container_volume | 26 |
creator | MEIKLE, S. G HATANAKA, Y |
description | The current-voltage characteristics and visible and X-ray photocurrent characteristics have been investigated for a heterojunction diode constructed of plasma-deposited hydrogenated amorphous silicon (a-Si:H) and single crystal cadmium telluride (c-CdTe). Devices showed low reverse bias saturation current, a photoresponse spectrum ranging from approximately 400-800 nm and a 3 decade increase in reverse bias saturation current when exposed to 40 keV X-rays. |
doi_str_mv | 10.1143/jjap.26.l1812 |
format | Article |
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G ; HATANAKA, Y</creator><creatorcontrib>MEIKLE, S. G ; HATANAKA, Y</creatorcontrib><description>The current-voltage characteristics and visible and X-ray photocurrent characteristics have been investigated for a heterojunction diode constructed of plasma-deposited hydrogenated amorphous silicon (a-Si:H) and single crystal cadmium telluride (c-CdTe). 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G</creatorcontrib><creatorcontrib>HATANAKA, Y</creatorcontrib><title>Characteristics of the hydrogenated amorphous silicon-crystalline cadmium telluride heterojunction diode</title><title>Japanese Journal of Applied Physics</title><description>The current-voltage characteristics and visible and X-ray photocurrent characteristics have been investigated for a heterojunction diode constructed of plasma-deposited hydrogenated amorphous silicon (a-Si:H) and single crystal cadmium telluride (c-CdTe). 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G</creatorcontrib><creatorcontrib>HATANAKA, Y</creatorcontrib><collection>Pascal-Francis</collection><collection>CrossRef</collection><jtitle>Japanese Journal of Applied Physics</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>MEIKLE, S. G</au><au>HATANAKA, Y</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Characteristics of the hydrogenated amorphous silicon-crystalline cadmium telluride heterojunction diode</atitle><jtitle>Japanese Journal of Applied Physics</jtitle><date>1987-11-01</date><risdate>1987</risdate><volume>26</volume><issue>11</issue><spage>L1812</spage><epage>L1814</epage><pages>L1812-L1814</pages><issn>0021-4922</issn><eissn>1347-4065</eissn><coden>JJAPA5</coden><abstract>The current-voltage characteristics and visible and X-ray photocurrent characteristics have been investigated for a heterojunction diode constructed of plasma-deposited hydrogenated amorphous silicon (a-Si:H) and single crystal cadmium telluride (c-CdTe). Devices showed low reverse bias saturation current, a photoresponse spectrum ranging from approximately 400-800 nm and a 3 decade increase in reverse bias saturation current when exposed to 40 keV X-rays.</abstract><cop>Tokyo</cop><pub>Japanese journal of applied physics</pub><doi>10.1143/jjap.26.l1812</doi></addata></record> |
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issn | 0021-4922 1347-4065 |
language | eng |
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source | IOP Publishing Journals; Institute of Physics (IOP) Journals - HEAL-Link |
subjects | Applied sciences Exact sciences and technology Other techniques and industries |
title | Characteristics of the hydrogenated amorphous silicon-crystalline cadmium telluride heterojunction diode |
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