Auto-doping phenomena for the InGaAsP active layer in DH structure grown by LPE

The behavior of diffused Zn and Te impurities in the InGaAsP-InP DH laser structure grown by LPE has been investigated by means of secondary ion mass spectrometry (SIMS) and photoluminescence (PL) technique. Judging from SIMS profiles of these impurities in the InGaAsP active layer, we have found th...

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Veröffentlicht in:Japanese Journal of Applied Physics 1984-01, Vol.23 (9), p.L700-L702
Hauptverfasser: SASAI, Y, YOSHIOKA, Y, HASE, N
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container_issue 9
container_start_page L700
container_title Japanese Journal of Applied Physics
container_volume 23
creator SASAI, Y
YOSHIOKA, Y
HASE, N
description The behavior of diffused Zn and Te impurities in the InGaAsP-InP DH laser structure grown by LPE has been investigated by means of secondary ion mass spectrometry (SIMS) and photoluminescence (PL) technique. Judging from SIMS profiles of these impurities in the InGaAsP active layer, we have found that a mutual diffusion occurs in this layer and that these impurities at the heterointerface pile up. The study of PL measurements has further shown that the diffused impurities influence the optical properties of the active layer.
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subjects Condensed matter: structure, mechanical and thermal properties
Exact sciences and technology
Physical properties of thin films, nonelectronic
Physics
Surfaces and interfaces
thin films and whiskers (structure and nonelectronic properties)
title Auto-doping phenomena for the InGaAsP active layer in DH structure grown by LPE
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