Ohmic Contact Properties of Magnesium Evaporated onto Undoped and P-doped a-Si: H

We have investigated the current-voltage characteristics of metal/undoped a -Si: H/ n + (or p + ) c -Si structures using Mg, Au, Pt and Al. It has been indicated that the energy band of undoped a-Si: H shows a downward bending against Mg, being analogous to n + a -Si: H/undoped a -Si: H contact, whi...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
Veröffentlicht in:Japanese Journal of Applied Physics 1983-01, Vol.22 (3A), p.L197
Hauptverfasser: Matsuura, Hideharu, Okuno, Tetsuhiro, Okushi, Hideyo, Yamasaki, Satoshi, Matsuda, Akihisa, Hata, Nobuhiro, Oheda, Hidetoshi, Tanaka, Kazunobu
Format: Artikel
Sprache:eng
Online-Zugang:Volltext
Tags: Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
Beschreibung
Zusammenfassung:We have investigated the current-voltage characteristics of metal/undoped a -Si: H/ n + (or p + ) c -Si structures using Mg, Au, Pt and Al. It has been indicated that the energy band of undoped a-Si: H shows a downward bending against Mg, being analogous to n + a -Si: H/undoped a -Si: H contact, while the band shows an upward bending against Au, Pt and Al. Mg/undoped a -Si: H contact is found to allow injection of electrons into the conduction band of a -Si: H, providing us a good ohmic contact property. This contact does not exhibit the thermal-degradation at least up to 100°C.
ISSN:0021-4922
1347-4065
DOI:10.1143/JJAP.22.L197