Formation of Ultrafine Particles by Gas-Evaporation Technique. V. Silicon and Germanium in Argon

Formation of Ultrafine Particles by Gas-Evaporation Technique. V. Silicon and Germanium in Argon

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Veröffentlicht in:Japanese Journal of Applied Physics 1978, Vol.17 (2), p.291-297
Hauptverfasser: Saito, Yahachi, Yatsuya, Shigeki, Mihama, Kazuhiro, Uyeda, Ryozi
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container_title Japanese Journal of Applied Physics
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creator Saito, Yahachi
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Mihama, Kazuhiro
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source IOP Publishing Journals; Institute of Physics (IOP) Journals - HEAL-Link
title Formation of Ultrafine Particles by Gas-Evaporation Technique. V. Silicon and Germanium in Argon
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