Calculating correlation factor for substrate and film coating profiles according to data of atomic force microscopy
The technique is presented allowing calculating the correlation factor for the substrate and film coating profiles on the basis of the data of atomic force microscopy. This factor is a function of spatial frequency and characterizes the degree of profile consistency. The effect of artifacts of atomi...
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| Veröffentlicht in: | Technical physics letters 2012-09, Vol.38 (9), p.777-779 |
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| Hauptverfasser: | , , |
| Format: | Artikel |
| Sprache: | eng |
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| Online-Zugang: | Volltext |
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| Zusammenfassung: | The technique is presented allowing calculating the correlation factor for the substrate and film coating profiles on the basis of the data of atomic force microscopy. This factor is a function of spatial frequency and characterizes the degree of profile consistency. The effect of artifacts of atomic force microscopy on the calculated correlation factor is studied. The range of reliable spatial frequencies is determined. The correlation factor is calculated for a multilayer mirror coating and substrate. |
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| ISSN: | 1063-7850 1090-6533 |
| DOI: | 10.1134/S1063785012090064 |