Effect of bottom-electrode morphology on the dielectric characteristics of the metal-ferroelectric-metal planar structure

The effect of the morphology of metal-ferroelectric-metal interfaces on their electrical properties is studied. The effect of buffer layers and methods for depositing electrodes on ferroelectric-film morphology are experimentally studied. A theoretical analysis of the dielectric properties is performed based on the experimental data for heterostructures; however, final estimation is carried out using mathematical modeling methods.