High-power pulse-emitting lasers in the 1.5–1.6 μm spectral region

The metalorganic chemical vapor deposition (MOCVD) method is used for growing heterostructures in the system of AlGaInAs/InP materials with different versions of the configuration of the active region. Laser diodes are fabricated from the grown heterostructures; with the purpose of increasing the ou...

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Veröffentlicht in:Semiconductors (Woodbury, N.Y.) N.Y.), 2014, Vol.48 (1), p.95-98
Hauptverfasser: Gorlachuk, P. V., Ryaboshtan, Yu. L., Marmalyuk, A. A., Kurnosov, V. D., Kurnosov, K. V., Zhuravleva, O. V., Romantsevich, V. I., Chernov, R. V., Ivanov, A. V., Simakov, V. A.
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Sprache:eng
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Zusammenfassung:The metalorganic chemical vapor deposition (MOCVD) method is used for growing heterostructures in the system of AlGaInAs/InP materials with different versions of the configuration of the active region. Laser diodes are fabricated from the grown heterostructures; with the purpose of increasing the output optical power, the laser diodes are integrated into bars and arrays. Single laser diodes exhibit a high output power of ∼6 W in the pulse mode. The laser bars exhibit an output power of 20 W in the pulse mode. The highest achieved pulse output optical power for an array of 30 elements amounts to ∼110 W.
ISSN:1063-7826
1090-6479
DOI:10.1134/S106378261401014X