High-performance InGaP/GaAs pnp δ-doped heterojunction bipolar transistor

In this article, a novel InGaP/GaAs pnp δ-doped heterojunction bipolar transistor is first demonstrated. Though the valence band discontinuity at InGaP/GaAs heterojunction is relatively large, the addition of a δ-doped sheet between two spacer layers at the emitter-base (E-B) junction effectively el...

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Veröffentlicht in:Semiconductors (Woodbury, N.Y.) N.Y.), 2009-07, Vol.43 (7), p.939-942
Hauptverfasser: Tsai, Jung-Hui, Chiu, Shao-Yen, Lour, Wen-Shiung, Guo, Der-Feng
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Sprache:eng
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Zusammenfassung:In this article, a novel InGaP/GaAs pnp δ-doped heterojunction bipolar transistor is first demonstrated. Though the valence band discontinuity at InGaP/GaAs heterojunction is relatively large, the addition of a δ-doped sheet between two spacer layers at the emitter-base (E-B) junction effectively eliminates the potential spike and increases the confined barrier for electrons, simultaneously. Experimentally, a high current gain of 25 and a relatively low E-B offset voltage of 60 mV are achieved. The offset voltage is much smaller than the conventional InGaP/GaAs pnp HBT. The proposed device could be used for linear amplifiers and low-power complementary integrated circuit applications.
ISSN:1063-7826
1090-6479
DOI:10.1134/S1063782609070227