High-performance InGaP/GaAs pnp δ-doped heterojunction bipolar transistor
In this article, a novel InGaP/GaAs pnp δ-doped heterojunction bipolar transistor is first demonstrated. Though the valence band discontinuity at InGaP/GaAs heterojunction is relatively large, the addition of a δ-doped sheet between two spacer layers at the emitter-base (E-B) junction effectively el...
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Veröffentlicht in: | Semiconductors (Woodbury, N.Y.) N.Y.), 2009-07, Vol.43 (7), p.939-942 |
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Hauptverfasser: | , , , |
Format: | Artikel |
Sprache: | eng |
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Online-Zugang: | Volltext |
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Zusammenfassung: | In this article, a novel InGaP/GaAs
pnp
δ-doped heterojunction bipolar transistor is first demonstrated. Though the valence band discontinuity at InGaP/GaAs heterojunction is relatively large, the addition of a δ-doped sheet between two spacer layers at the emitter-base (E-B) junction effectively eliminates the potential spike and increases the confined barrier for electrons, simultaneously. Experimentally, a high current gain of 25 and a relatively low E-B offset voltage of 60 mV are achieved. The offset voltage is much smaller than the conventional InGaP/GaAs
pnp
HBT. The proposed device could be used for linear amplifiers and low-power complementary integrated circuit applications. |
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ISSN: | 1063-7826 1090-6479 |
DOI: | 10.1134/S1063782609070227 |