Exciton states and photoluminescence of silicon and germanium nanocrystals in an Al2O3 matrix

This paper deals with the theoretical and experimental study of radiative processes in zero-dimensional Si and Ge nanostructures consisting of a system of Si or Ge nanocrystals embedded in an Al 2 O 3 matrix. The Al 2 O 3 films containing Si or Ge quantum dots were produced by pulsed laser-assisted...

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Veröffentlicht in:Semiconductors (Woodbury, N.Y.) N.Y.), 2008-10, Vol.42 (10), p.1194-1199
Hauptverfasser: Kupchak, I. M., Kryuchenko, Yu. V., Korbutyak, D. V., Sachenko, A. V., Kaganovich, É. B., Manoĭlov, É. G., Begun, É. V.
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Sprache:eng
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Zusammenfassung:This paper deals with the theoretical and experimental study of radiative processes in zero-dimensional Si and Ge nanostructures consisting of a system of Si or Ge nanocrystals embedded in an Al 2 O 3 matrix. The Al 2 O 3 films containing Si or Ge quantum dots were produced by pulsed laser-assisted deposition. The timeresolved photoluminescence spectra of the films were recorded in the energy range from 1.4 to 3.2 eV in the range of photoluminescence relaxation times between 50 ns and 20 μs. The exciton binding energy and the energy of radiative excitonic transitions are calculated, taking into account the finite barrier height and the polarization of heterointerfaces. In addition, the excitonic photoluminescence spectra are calculated, taking into account the effect of quantum mesoscopic fluctuations and the possible nonmonotonically varying dependence of the radiative zero-phonon lifetime of excitons on the dimensions of the quantum dots. The observed agreement between the calculated and recorded photoluminescence spectra confirms the excitonic nature of photoluminescence and provides a means for the determination of the model parameters of photoluminescence in the nanostructures.
ISSN:1063-7826
1090-6479
DOI:10.1134/S1063782608100096