Fragmentation processes of vanadium and niobium oxide clusters sputtered by ion bombardment

The mass distribution of emitted V n O m − and Nb n O m − clusters and their unimolecular decay by all stoichiometrically possible fragmentation channels, which takes place under the sputtering of niobium and vanadium surfaces and blowing by oxygen, are studied. It is shown that the formation, excit...

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Veröffentlicht in:Surface investigation, x-ray, synchrotron and neutron techniques x-ray, synchrotron and neutron techniques, 2014-03, Vol.8 (2), p.254-258
Hauptverfasser: Dzhemilev, N. Kh, Kovalenko, S. F., Maksimov, S. E., Tukfatullin, O. F., Khojiev, Sh. T.
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Sprache:eng
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Zusammenfassung:The mass distribution of emitted V n O m − and Nb n O m − clusters and their unimolecular decay by all stoichiometrically possible fragmentation channels, which takes place under the sputtering of niobium and vanadium surfaces and blowing by oxygen, are studied. It is shown that the formation, excitation, and unimolecular fragmentation of V n O m − and Nb n O m − clusters can be described by a statistical recombination mechanism. Clusters are formed over the target surfaces as a result of binary collisions of independently sputtered ions, atoms, and molecules.
ISSN:1027-4510
1819-7094
DOI:10.1134/S1027451014020128