Features of the manufacture of deep X-ray lithography masks in the siberian synchrotron and terahertz radiation center

Features of the manufacture of deep X-ray lithography masks in the siberian synchrotron and terahertz radiation center

The development of a low-cost technology to manufacture high-contrast X-ray LIGA masks is topical because this technology is important for various applied research on microstructured products with minimum element sizes of 10–50 μm, such as microfluid analytical systems, selective waveguide mesh-base...

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Veröffentlicht in:Surface investigation, x-ray, synchrotron and neutron techniques x-ray, synchrotron and neutron techniques, 2011-02, Vol.5 (1), p.159-165
Hauptverfasser: Gol’denberg, B. G., Abramskii, A. Yu, Zelinskii, A. G., Maslii, A. I., Maksimovskii, E. A., Kondrat’ev, V. I., Korol’kov, V. P., Kuper, K. E., Petrova, E. V., Pindyurin, V. F.
Format: Artikel
Sprache:eng
Schlagworte:
Chemistry and Materials Science
Materials Science
Surfaces and Interfaces
Thin Films
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Beschreibung
Zusammenfassung:The development of a low-cost technology to manufacture high-contrast X-ray LIGA masks is topical because this technology is important for various applied research on microstructured products with minimum element sizes of 10–50 μm, such as microfluid analytical systems, selective waveguide mesh-based elements to control terahertz (THz) radiation, microshaped optical elements for the visible range, etc. Technological particularities of mask manufacture are considered. A method to check the quality of masks is presented. Test microproducts manufactured using the produced deep X-ray lithography masks are demonstrated.
ISSN:1027-4510
1819-7094
DOI:10.1134/S1027451010111011