Monte Carlo modelling of wet-chemical lithography with masks

We propose Monte Carlo simulation of the etching process in two dimensions for the manufacture of microchannels and microcavities on a solid substrate. The method combines the effect of two different regimes based on diffusion-limited disaggregation and reaction-limited erosion, respectively. Besides, the role of the selectivity in site extraction is taken into account to foresee the effects of the temperature of the eroding bath. This technique proves to be a valid alternative to more complex analytical methods to describe surface decay processes in the presence of overhangs. The relevant geometries of the etched surfaces are analyzed, and other statistical properties of the cavities are discussed and compared to the ones predicted by continuum models.