Absolute calibration of X-ray optical elements and detectors at a wavelength of 46.9 nm

The results are presented of the absolute calibration of X-ray optical elements (diffraction gratings and Sc/Si multilayers) and detectors (an УΦ-4 photographic film and a vacuum X-ray diode) used in diagnostic devices to study generation of X-ray laser radiation in an argon plasma of a capillary di...

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Veröffentlicht in:Instruments and experimental techniques (New York) 2010-11, Vol.53 (6), p.873-876
Hauptverfasser: Gilev, O. N., Vikhlyaev, D. A., Legkodymov, A. A., Nikolenko, A. D.
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Sprache:eng
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Zusammenfassung:The results are presented of the absolute calibration of X-ray optical elements (diffraction gratings and Sc/Si multilayers) and detectors (an УΦ-4 photographic film and a vacuum X-ray diode) used in diagnostic devices to study generation of X-ray laser radiation in an argon plasma of a capillary discharge (λ = 46.9 nm). The measurements have been performed at the soft X-ray and vacuum UV station of the VEPP-4 storage ring at the Siberian International Center of Synchrotron Radiation. An absolutely calibrated AXUV 100G photodiode has been used as a reference detector. The relative error of calibration is 10%. The measured reflectances of the multilayer mirrors and gratings are in good agreement (within the limits of errors) with the results of their calibration at the RKK-1-100 X-ray calibration facility.
ISSN:0020-4412
1608-3180
DOI:10.1134/S0020441210060199