Low-power inductive RF plasma sources for technological applications

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Veröffentlicht in:	Plasma physics reports 2004-08, Vol.30 (8), p.687-697
Hauptverfasser:	Vavilin, K. V., Rukhadze, A. A., Ri, M. Kh, Plaksin, V. Yu
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Sprache:	eng
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title	Low-power inductive RF plasma sources for technological applications
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