Dynamic character of compositional sputter depth profiling by SIMS: A comparison of different models for quantitative profile evaluation

We are dealing with some new insights in the quantification of sputter depth profiles obtained by secondary ion mass spectroscopy, which can be easily extended to XPS or AES. Recent publications present a rather negative image of the mixing-roughness-information depth (MRI) model of quantitative sputter depth profile evaluation in conjunction with Dowsett’s up-and-down slope (UDS) model, at first we attempt to point out the merits of the MRI model. Since these publications come up with a new, alternative model [called roughness-mixing-recoil model (RMR)], we discuss in detail the flaws of both the UDS and the RMR models. In conclusion, we present some instructive examples that show the decisive validity of the MRI model in describing the nature of the process of sputter depth profiling.