Synchrotron light as a source for extreme ultraviolet lithography

In August 1998 a new European research program named Extreme Ultraviolet Concept Lithography Development System (EUCLIDES) was started. The program headed by ASM Lithography (ASML), partnered by Carl Zeiss and Oxford Instruments is evaluating extreme ultraviolet (EUV) light as a viable lithographic solution for resolutions of 70 nm and below. Oxford Instruments has investigated various options to use as synchrotron light sources: bending magnets, undulators, and wigglers. Output characteristics are given in terms of angular distribution and power spectrum. It will be explained wigglers are the preferred synchrotron light. The outline design of the storage ring is presented. The lattice is reviewed together with the light output properties and space requirements. How these drive the cost of ownership is addressed. Finally a brief comparison is made between this and the alternative (laser plasma) sources for EUV.