New field-emission device with improved vacuum features
We introduce in this article a novel geometry that can be used in the manufacturing of field-emission displays. The geometry proposed combines superior vacuum conductance and a good field-enhancement factor. A theoretical model is developed for the calculation of the upper limit to the electrostatic...
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Veröffentlicht in: | Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films Surfaces, and Films, 2000-07, Vol.18 (4), p.1818-1822 |
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Hauptverfasser: | , , , , , |
Format: | Artikel |
Sprache: | eng |
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Online-Zugang: | Volltext |
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Zusammenfassung: | We introduce in this article a novel geometry that can be used in the manufacturing of field-emission displays. The geometry proposed combines superior vacuum conductance and a good field-enhancement factor. A theoretical model is developed for the calculation of the upper limit to the electrostatic field at the emitting regions, and these values are compared to those calculated for the actual geometry. The vacuum conductance of the proposed geometry is also calculated, and we show that conductances up to an order of magnitude higher than other schemes are readily achievable. Finally, we present field-emission results obtained from a prototype, and compare them with other emission schemes. |
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ISSN: | 0734-2101 1520-8559 |
DOI: | 10.1116/1.582430 |