Generation of atomic nitrogen flux monitoring by an atomic absorption detection system at 120 nm

We have demonstrated a lamp-based atomic absorption detection system at 120 nm for monitoring atomic nitrogen generation in microwave discharge. Atomic nitrogen flux and dissociation ratio were evaluated by the atomic absorption. Delivery of atomic nitrogen with a quartz tube was investigated. By su...

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Veröffentlicht in:Journal of vacuum science & technology. A, Vacuum, surfaces, and films Vacuum, surfaces, and films, 1999-01, Vol.17 (1), p.183-189
Hauptverfasser: Wang, Weizhi, Hammond, R. H., Arnason, S. B., Beasley, M. R.
Format: Artikel
Sprache:eng
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Zusammenfassung:We have demonstrated a lamp-based atomic absorption detection system at 120 nm for monitoring atomic nitrogen generation in microwave discharge. Atomic nitrogen flux and dissociation ratio were evaluated by the atomic absorption. Delivery of atomic nitrogen with a quartz tube was investigated. By suppressing the recombination of the atomic nitrogen with the Teflon insert, the delivered atomic nitrogen flux was enhanced by a factor of 3–10. At a microwave power of 300 W, an atomic flux of 5×10 16   cm −2   s −1 , sufficient for growth of nitride thin films, was achieved. A model of recombination was used for explaining the experimental results, a maximum dissociation ratio of ∼2% at the plasma region was estimated based on the measured atomic nitrogen densities.
ISSN:0734-2101
1520-8559
DOI:10.1116/1.581571