Fabrication process for 200 nm-pitch polished freestanding ultrahigh aspect ratio gratings
A fully integrated fabrication process has been developed to fabricate freestanding, ultrahigh aspect ratio silicon gratings with potassium hydroxide (KOH)-polished sidewalls. The gratings are being developed for wavelength-dispersive, soft x-ray spectroscopy on future space telescopes. For this app...
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| Veröffentlicht in: | Journal of vacuum science and technology. B, Nanotechnology & microelectronics Nanotechnology & microelectronics, 2016-11, Vol.34 (6) |
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| Hauptverfasser: | , , |
| Format: | Artikel |
| Sprache: | eng |
| Online-Zugang: | Volltext |
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| Zusammenfassung: | A fully integrated fabrication process has been developed to fabricate freestanding, ultrahigh aspect ratio silicon gratings with potassium hydroxide (KOH)-polished sidewalls. The gratings are being developed for wavelength-dispersive, soft x-ray spectroscopy on future space telescopes. For this application, the grating needs to have a large open-area fraction and smooth sidewalls (roughness |
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| ISSN: | 2166-2746 2166-2754 |
| DOI: | 10.1116/1.4966595 |