Promising method toward realization of ultra-low-cost silicon microrod array with nanotip

A low-cost two-step method for fabrication of silicon microrod array with nanotip on a low-doped p-type substrate was demonstrated. The two-step process involved anisotropic and electrochemical etching of single crystalline silicon samples. The silicon surface was first textured using anisotropic et...

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Veröffentlicht in:Journal of vacuum science and technology. B, Nanotechnology & microelectronics Nanotechnology & microelectronics, 2015-03, Vol.33 (2)
Hauptverfasser: Yaghootkar, Bahareh, Kahrizi, Mojtaba
Format: Artikel
Sprache:eng
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Zusammenfassung:A low-cost two-step method for fabrication of silicon microrod array with nanotip on a low-doped p-type substrate was demonstrated. The two-step process involved anisotropic and electrochemical etching of single crystalline silicon samples. The silicon surface was first textured using anisotropic etching to generate the pyramid-shaped structure on the surface and was further followed by electrochemical anodic etching to create silicon microrod arrays. The vertical silicon microrod arrays are a direct product of the anodization stage, where the shape of the pyramid structures was altered and transformed into free-standing microrods. The effects of several parameters including the time, the pyramid size uniformity, and HF concentration on the final products were studied. It was observed that the diameters of the pyramids were decreased as the anodic etching time was extended to 10 min. Beyond 10 min, anodic etching did not cause any further diameter change. Experiments revealed that in order to realize silicon microrods, the size of the pyramids was required to be greater than the space charge region width. An optimal range of HF concentration, where the silicon microrods can be obtained was determined.
ISSN:2166-2746
2166-2754
DOI:10.1116/1.4913877