Shortwave-infrared photoluminescence from Ge1−xSnx thin films on silicon

Ge1−xSnx thin films with Sn composition up to 7% were epitaxially grown by chemical vapor deposition on silicon. Temperature-dependent photoluminescence was investigated and the peaks corresponding to the direct and indirect transitions were observed in a wavelength range from 1.6 to 2.2 μm. The exa...

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Veröffentlicht in:Journal of vacuum science and technology. B, Nanotechnology & microelectronics Nanotechnology & microelectronics, 2014-11, Vol.32 (6)
Hauptverfasser: Ghetmiri, Seyed Amir, Du, Wei, Conley, Benjamin R., Mosleh, Aboozar, Nazzal, Amjad, Sun, Greg, Soref, Richard A., Margetis, Joe, Tolle, John, Naseem, Hameed A., Yu, Shui-Qing
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Sprache:eng
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Zusammenfassung:Ge1−xSnx thin films with Sn composition up to 7% were epitaxially grown by chemical vapor deposition on silicon. Temperature-dependent photoluminescence was investigated and the peaks corresponding to the direct and indirect transitions were observed in a wavelength range from 1.6 to 2.2 μm. The exact peak positions obtained from Gaussian fitting were fitted with an empirical temperature dependent band-gap equation (Varshni relationship). The separation between direct and indirect peaks was equal to 0.012 eV for GeSn thin film with 7% Sn content at room temperature. This observation indicates that the indirect-to-direct crossover would take place at slightly higher Sn compositions.
ISSN:2166-2746
2166-2754
DOI:10.1116/1.4897917