In situ Auger probe enabling epitaxy composition control of alloys by elemental surface analysis

An in situ Auger probe (AP) is employed to monitor changes in growth surface chemistry of the component elements of Terfenol-D, a completely miscible alloy of DyFe2 and TbFe2. The AP's surface sensitivity is quantified by depositing Dy onto a layer of Tb in 0.01 monolayer increments. The AP is...

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Veröffentlicht in:Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures 2013-05, Vol.31 (3)
Hauptverfasser: Laws Calley, W., Greenlee, Jordan D., Henderson, Walter E., Lowder, Jonathan, Moseley, Michael W., Alan Doolittle, W., Staib, Philippe G.
Format: Artikel
Sprache:eng
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Zusammenfassung:An in situ Auger probe (AP) is employed to monitor changes in growth surface chemistry of the component elements of Terfenol-D, a completely miscible alloy of DyFe2 and TbFe2. The AP's surface sensitivity is quantified by depositing Dy onto a layer of Tb in 0.01 monolayer increments. The AP is able to distinguish surface coverage changes as small as 2% of a monolayer when elements with similar Auger spectra are used. The AP also allowed the identification of oxygen contamination in the system. Additionally, the glancing angle incidence primary electrons result in enhanced surface sensitivity compared to a more traditional Auger electrons spectroscopy configuration.
ISSN:2166-2746
1520-8567
2166-2754
DOI:10.1116/1.4798653