Development of a method for investigating carbon removal processes during photoassisted film growth using organometallic precursors: Application to platinum
A method is used to investigate carbon removal pathways during metal film growth using organometallic precursors. The approach combines a time-of-flight mass spectrometer with a growth chamber from which substrates can be removed during real-time film growth. Consequently, evolving mass spectral sig...
Gespeichert in:
Veröffentlicht in: | Journal of Vacuum Science and Technology. A, International Journal Devoted to Vacuum, Surfaces, and Films International Journal Devoted to Vacuum, Surfaces, and Films, 2007-01, Vol.25 (1), p.104-109 |
---|---|
Hauptverfasser: | , , , , , , |
Format: | Artikel |
Sprache: | eng |
Schlagworte: | |
Online-Zugang: | Volltext |
Tags: |
Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
|
Zusammenfassung: | A method is used to investigate carbon removal pathways during metal film growth using organometallic precursors. The approach combines a time-of-flight mass spectrometer with a growth chamber from which substrates can be removed during real-time film growth. Consequently, evolving mass spectral signatures can be correlated with changing film properties. Although more general as a technique, results are presented for the photoassisted growth of Pt from
C
H
3
Cp
Pt
(
C
H
3
)
3
in a
D
2
atmosphere. Here, a marked increase in deuterium/hydrogen exchange is clearly correlated with an increase in the Pt:C ratio for the metal films, as determined by x-ray photoelectron spectroscopy. However, results for growth with
C
H
3
C
H
2
Cp
Pt
(
C
H
3
)
3
as well as
(
C
H
3
)
3
C
Cp
Pt
(
C
H
3
)
3
suggest that while extensive
D
∕
H
exchange can be a feature of the growth process, it is not a prerequisite for producing films with relatively high Pt:C ratios. |
---|---|
ISSN: | 0734-2101 1553-1813 1520-8559 |
DOI: | 10.1116/1.2400681 |