Deposition, microstructure, and properties of nanocrystalline Ti(C,O,N) coatings

Chemical vapor deposition of Ti(C,N) coatings from the TiCl 4 – CH 3 CN–N 2 – H 2 system on cemented carbide substrates was studied. The morphology and grain size of the coatings were modified using carbon monoxide (CO). Transmission electron microscopy confirmed that grain refinement of the Ti(C,N)...

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Veröffentlicht in:Journal of vacuum science & technology. A, Vacuum, surfaces, and films Vacuum, surfaces, and films, 2003-01, Vol.21 (1), p.66-75
Hauptverfasser: Ruppi, S., Larsson, A.
Format: Artikel
Sprache:eng
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Zusammenfassung:Chemical vapor deposition of Ti(C,N) coatings from the TiCl 4 – CH 3 CN–N 2 – H 2 system on cemented carbide substrates was studied. The morphology and grain size of the coatings were modified using carbon monoxide (CO). Transmission electron microscopy confirmed that grain refinement of the Ti(C,N) coatings could be obtained by means of CO doping and nanocrystalline coatings were obtained at CO levels exceeding 6%. CO doping resulted in the incorporation of oxygen in the structure, but no segregation of oxygen to grain boundaries was observed. The coatings appeared to be of homogeneous composition even at the highest CO levels. Both improved coating hardness and surface quality were obtained with decreasing grain size. However, the coatings exhibited clearly lower crater wear resistance in the nanograined region. This was explained by an increased tendency for grain-boundary sliding in the nanocrystalline coatings leading to more pronounced plastic deformation.
ISSN:0734-2101
1520-8559
DOI:10.1116/1.1521965