Material properties of ion beam deposited oxides for the optoelectronic industry

Material properties of ion beam deposited oxides for the optoelectronic industry

High quality, dense films of SiO 2 , Al 2 O 3 , Ta 2 O 5 , and TiO 2 were deposited with an ion beam deposition system (IBD). IBD has significant advantages over other techniques in terms of directionality, stress control, repeatability, thermal stability, and film uniformity [J. J. Cuomo, J. M. E....

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Veröffentlicht in:Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films Surfaces, and Films, 2002-05, Vol.20 (3), p.1135-1140
Hauptverfasser: Devasahayam, Adrian J., Agatic, Ivo, Druz, Boris, Hegde, Hari, Zaritsky, Isaac, Das, Suhit R., Boudreau, Marcel, Yin, Tao, Mallard, Robert, LaFramboise, Sylvain
Format: Artikel
Sprache:eng
Schlagworte:
Alumina
Compressive stress
Ion beams
Light absorption
Optoelectronic devices
Refractive index
Silica
Tantalum compounds
Thermodynamic stability
Titanium dioxide
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Beschreibung
Zusammenfassung:High quality, dense films of SiO 2 , Al 2 O 3 , Ta 2 O 5 , and TiO 2 were deposited with an ion beam deposition system (IBD). IBD has significant advantages over other techniques in terms of directionality, stress control, repeatability, thermal stability, and film uniformity [J. J. Cuomo, J. M. E. Harper, C. R. Guarnieri, D. S. Yee, L. J. Atanasio, J. Angilello, C. T. Wu, and R. H. Hammond, J. Vac. Sci. Technol. 20, 349 (1982)]. To decrease the surface damage induced by ion bombardment, a multi-energy process was developed. This is especially important for laser facet coatings. The oxide films were optimized for the desired refractive index and zero absorption. Stress values of −0.2 to −0.5 GPa (compressive) and extremely good uniformity (
ISSN:0734-2101
1520-8559
DOI:10.1116/1.1463077