High characteristic temperature (T 0 =243 K) of stacked InGaAs quantum wire lasers grown on (775)B GaAs substrates by molecular beam epitaxy

Stacked In 0.15 Ga 0.85 As quantum wire (QWR) laser structures were grown on (775)B-oriented GaAs substrates by molecular beam epitaxy. The laser active region consists of three 2.4-nm-thick QWR layers separated by thin (0.5 or 1 nm thick) AlAs barriers. It showed better one-dimensionality than that...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
Veröffentlicht in:Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures 2002-05, Vol.20 (3), p.1270-1273
Hauptverfasser: Ohno, Yasuhide, Kanamori, Hironori, Shimomura, Satoshi, Hiyamizu, Satoshi
Format: Artikel
Sprache:eng
Online-Zugang:Volltext
Tags: Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
Beschreibung
Zusammenfassung:Stacked In 0.15 Ga 0.85 As quantum wire (QWR) laser structures were grown on (775)B-oriented GaAs substrates by molecular beam epitaxy. The laser active region consists of three 2.4-nm-thick QWR layers separated by thin (0.5 or 1 nm thick) AlAs barriers. It showed better one-dimensionality than that of nonstacked (775)B QWRs. The stacking (775)B QWR lasers oscillated at room temperature with the threshold current density of about 3 kA/cm 2 under the pulsed current condition. They showed the characteristic temperature of T 0 ∼243 K in the temperature range of 20–80 °C, which is very high not only T 0 values of previous (775)B QWR lasers but also among those of the low-dimensional quantum structure lasers reported so far.
ISSN:0734-211X
1071-1023
1520-8567
DOI:10.1116/1.1456520