Structural, morphological, and mechanical properties of plasma deposited hydrogenated amorphous carbon thin films: Ar gas dilution effects

In this article, a thorough investigation of a-C:H films deposited by rf glow discharge from methane–argon mixtures, containing different Ar fractions, onto silicon substrate is presented. The structural, mechanical, and morphological properties of these films were investigated by complementary tech...

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Veröffentlicht in:Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films Surfaces, and Films, 2001-07, Vol.19 (4), p.1611-1616
Hauptverfasser: Valentini, L., Kenny, J. M., Mariotto, G., Tosi, P., Carlotti, G., Socino, G., Lozzi, L., Santucci, S.
Format: Artikel
Sprache:eng
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Zusammenfassung:In this article, a thorough investigation of a-C:H films deposited by rf glow discharge from methane–argon mixtures, containing different Ar fractions, onto silicon substrate is presented. The structural, mechanical, and morphological properties of these films were investigated by complementary techniques, such as x-ray reflectivity, Raman spectroscopy, Brillouin light scattering, pin on disk test, and atomic force microscopy. Experimental results are examined to develop a coherent picture of the relationships among deposition parameters, microstructural features, and macroscopic properties. The consistency of the experimental results are checked with a new theoretical physical model that predicts the reaction probability for methyl radicals interacting with the surface of amorphous hydrogenated carbon films.
ISSN:0734-2101
1520-8559
DOI:10.1116/1.1336829