Radiation Tolerance of Amorphous Semiconductors
In an attempt to determine the threshold radiation damage in amorphous semiconductors, radiation tests were performed on amorphous semiconductor thin film materials and on threshold and memory devices. The influence of flash x-rays and neutron radiation upon the switching voltages, on- and off-state...
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Veröffentlicht in: | IEEE transactions on nuclear science 1976-02, Vol.23 (1), p.839-848 |
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Format: | Artikel |
Sprache: | eng |
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Zusammenfassung: | In an attempt to determine the threshold radiation damage in amorphous semiconductors, radiation tests were performed on amorphous semiconductor thin film materials and on threshold and memory devices. The influence of flash x-rays and neutron radiation upon the switching voltages, on- and off-state characteristics, dielectric response, optical transmission, absorption band edge and photoconductivity were measured prior to, during and following irradiation. These extensive tests showed the high radiation tolerance of amorphous semiconductor materials. Electrical and optical properties, other than photoconductivity, have a neutron radiation tolerance threshold above 1017 nvt in the steady state and 1014 nvt in short (50 μμsec to 16 msec) pulses. Photoconductivity increases by 1½ orders of magnitude at the level of 1014 nvt (short pulses of 50 μsec). Super flash x-rays up to 5000 rads (Si), 20 nsec, do not initiate switching in off-state samples which are voltage biased up to 90% of the threshold voltage. Both memory and threshold amorphous devices are capable of switching on and off during nuclear radiation transients at least as high as 2 × 1014 nvt in 50 μsec pulses. |
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ISSN: | 0018-9499 1558-1578 |
DOI: | 10.1109/TNS.1976.4328353 |