Precise Damage Observation in Ion-Beam Etched MTJ

Patterning damage at the sidewall in a magnetic tunnel junction (MTJ) was observed precisely using a rectangular MTJ where deterioration in crystallinity is easier to identify than in the case of a dot-shaped conventional MTJ. A 200-500 nm-square rectangular MTJ was patterned by a 200 eV ion beam (I...

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Veröffentlicht in:IEEE transactions on magnetics 2016-07, Vol.52 (7), p.1-3
Hauptverfasser: Ohsawa, Yuichi, Shimomura, Naoharu, Daibou, Tadaomi, Kamiguchi, Yuzo, Shirotori, Satoshi, Inokuchi, Tomoaki, Saida, Daisuke, Altansargai, Buyandalai, Kato, Yushi, Yoda, Hiroaki, Ohkubo, Tadakatsu, Hono, Kazuhiro
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Sprache:eng
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