Application of conformal mapping approximation techniques: parallel conductors of finite dimensions

Application of conformal mapping approximation techniques: parallel conductors of finite dimensions

This paper describes a novel approach to the application of conformal mapping to capacitance evaluation. A particular structure composed of an array of identical lines and located below a conductive plate is studied. Results show the application of conformal mapping can reduce computing time when us...

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Veröffentlicht in:IEEE transactions on instrumentation and measurement 2004-06, Vol.53 (3), p.812-821
Hauptverfasser: Pesonen, N., Kahn, W.K., Allen, R.A., Cresswell, M.W., Zaghloul, M.E.
Format: Artikel
Sprache:eng
Schlagworte:
Capacitance
Capacitive sensors
Conductors
Conformal mapping
Electronics industry
Geometry
Lithography
NIST
Optical sensors
Silicon
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Beschreibung
Zusammenfassung:This paper describes a novel approach to the application of conformal mapping to capacitance evaluation. A particular structure composed of an array of identical lines and located below a conductive plate is studied. Results show the application of conformal mapping can reduce computing time when using three-dimensional electrostatic modeling and it can be the basis of algorithms of practical applications, especially in the semiconductor industry.
ISSN:0018-9456
1557-9662
DOI:10.1109/TIM.2004.827065