Evaluation of Metal-Semiconductor Contact Quality: Correlation of 1/f Noise and Nonlinearity

Measurement of 1/f noise emerges as a valuable tool for contact quality evaluation, which simultaneously provides information about the 1/f noise magnitude and nonlinearity of the contact. This article investigates experimentally the correlation of current-voltage characteristics nonlinearity and 1/...

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Veröffentlicht in:IEEE transactions on electron devices 2022-12, Vol.69 (12), p.1-6
Hauptverfasser: Ciura, Lukasz, PawelSliz, Jarosz, Dawid, Krzeminski, Piotr, MichalMarchewka
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Sprache:eng
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Zusammenfassung:Measurement of 1/f noise emerges as a valuable tool for contact quality evaluation, which simultaneously provides information about the 1/f noise magnitude and nonlinearity of the contact. This article investigates experimentally the correlation of current-voltage characteristics nonlinearity and 1/f noise for the metal-semiconductor-metal structure. It was found that the nonlinearity and 1/f noise originate from metal-semiconductor contact. The relative 1/f noise of weak-nonlinear, roughly ohmic contact, is proportional to the parameter describing the nonlinearity. Further increase of contact nonlinearity, by decreasing the temperature, substantially increases the 1/f noise magnitude. The efforts to develop low-noise semiconductor devices should be focused on avoiding even weak nonlinearity of contacts because it results in substantial 1/f noise.
ISSN:0018-9383
1557-9646
DOI:10.1109/TED.2022.3218492