Tunability of Ferroelectric Hafnium Zirconium Oxide for Varactor Applications

In this article, we present the capacitance-voltage ( {C} - {V} ) characteristics of Hf x Zr 1− x O 2 metal-ferroelectric-metal (MFM) thin-film capacitors with various Zr doping, thicknesses, and annealing temperatures. The influence of doping, electric field cycling, and annealing temperature on tu...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
Veröffentlicht in:IEEE transactions on electron devices 2021-10, Vol.68 (10), p.5269-5276
Hauptverfasser: Abdulazhanov, Sukhrob, Lederer, Maximilian, Lehninger, David, Mart, Clemens, Ali, Tarek, Wang, Defu, Olivo, Ricardo, Emara, Jennifer, Kampfe, Thomas, Gerlach, Gerald
Format: Artikel
Sprache:eng
Schlagworte:
Online-Zugang:Volltext bestellen
Tags: Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
Beschreibung
Zusammenfassung:In this article, we present the capacitance-voltage ( {C} - {V} ) characteristics of Hf x Zr 1− x O 2 metal-ferroelectric-metal (MFM) thin-film capacitors with various Zr doping, thicknesses, and annealing temperatures. The influence of doping, electric field cycling, and annealing temperature on tuning characteristics (tunability) was analyzed and an optimized bias region for the maximum tunability was defined. Additional focus was made on an antiferroelectric-like (AFE) behavior, which occurs for > 50% Zr doping. The presence of both the ferroelectric and the AFE phase manifests itself in specific {C} - {V} behavior, where a reduced bias range is required for tuning, however, at the cost of a smaller tunability. The suitability of this behavior for varactor applications is also discussed.
ISSN:0018-9383
1557-9646
DOI:10.1109/TED.2021.3104532