Comparative Study on Performance of IGZO Transistors With Sputtered and Atomic Layer Deposited Channel Layer

The structural, chemical, and electrical properties of amorphous indium gallium zinc oxide (a-IGZO) films by magnetron sputtering and atomic layer deposition (ALD) were investigated where both a-IGZO films had a comparable cation composition. The ALD-derived a-IGZO film exhibited the higher atomic packing density, the effective suppression of trap-like oxygen vacancy defect (V O ), and the enhancement in the hybridization of the sp orbital of In, Ga, and Zn cations compared to those of the sputtered a-IGZO film. Hence, a significant improvement in terms of the field-effect mobility was observed for the thin-film transistors with an In 0.50 Ga 0.34 Zn 0.16 O channel by ALD (36.6 cm ^{\textsf {2}}/\text{V}\cdot \text{s} ) compared to that of the sputtered In 0.48 Ga 0.38 Zn 0.14 O transistor (20.1 cm ^{\textsf {2}}/\text{V}\cdot \text{s} ); the {I}_{\text {ON/OFF}} ratios for both were ~10 7 . Simultaneously, the gate bias stress stability and photobias stress stability were also improved for the IGZO transistors with an ALD-derived channel, which can be explained by its reduced trap-like V O density.