Limiting Factors of the Safe Operating Area for Power Devices

This paper gives an overview about different failure mechanisms which limit the safe operating area of power devices. It is demonstrated how the device internal processes can be investigated by means of device simulation. For instance, the electrothermal simulation of high-voltage diode turn-off rev...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
Veröffentlicht in:IEEE transactions on electron devices 2013-02, Vol.60 (2), p.551-562
Hauptverfasser: Schulze, H-J, Niedernostheide, F-J, Pfirsch, F., Baburske, R.
Format: Artikel
Sprache:eng
Schlagworte:
Online-Zugang:Volltext bestellen
Tags: Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
Beschreibung
Zusammenfassung:This paper gives an overview about different failure mechanisms which limit the safe operating area of power devices. It is demonstrated how the device internal processes can be investigated by means of device simulation. For instance, the electrothermal simulation of high-voltage diode turn-off reveals how a backside filament transforms into a continuous filament connecting the anode and cathode and how this can be accompanied with a transition from avalanche-induced into thermally driven carrier generation. A similar current destabilization may occur during insulated-gate bipolar transistor turn-off with a high turn-off rate, when the channel is closed quickly leading to strong dynamic avalanche. It is explained how the current filamentation depends on substrate resistivity, device thickness, channel width, and switching conditions (gate resistor and overcurrent). Filamentation processes during short-circuit events are discussed, and possible countermeasures are suggested. A mechanism of a periodically emerging and vanishing filament near the edge of the chip is presented. Examples on current destabilizing effects in gate turn-off thyristors, integrated gate-commutated thyristors, and metal-oxide-semiconductor field-effect transistors are given, and limitations of current device simulation are discussed.
ISSN:0018-9383
1557-9646
DOI:10.1109/TED.2012.2225148