1.5-V-Operation Ultralow Power Circuit of Poly-Si TFTs Fabricated Using the NAOS Method

We have fabricated thin-film transistors (TFTs) and liquid-crystal displays (LCDs) with monolithic drivers on glass substrates and achieved ultralow power consumption by operating with a low power-supply voltage at 3 V. The gate insulator of the TFTs has a stack structure with an ultrathin interfaci...

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Veröffentlicht in:IEEE transactions on electron devices 2012-02, Vol.59 (2), p.385-392
Hauptverfasser: Kubota, Y., Matsumoto, T., Tsuji, H., Suzuki, N., Imai, S., Kobayashi, H.
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Sprache:eng
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Zusammenfassung:We have fabricated thin-film transistors (TFTs) and liquid-crystal displays (LCDs) with monolithic drivers on glass substrates and achieved ultralow power consumption by operating with a low power-supply voltage at 3 V. The gate insulator of the TFTs has a stack structure with an ultrathin interfacial SiO 2 layer formed by nitric acid oxidation of silicon and a 40-nm-thick SiO 2 layer formed by plasma-enhanced chemical vapor deposition. Owing to the TFTs with the thin gate insulator, the driving circuits of the LCDs can be operated at a supply voltage of 1.5 V, which is much lower than that of conventional LCDs of 10-15 V.
ISSN:0018-9383
1557-9646
DOI:10.1109/TED.2011.2175395