Hetero-Gate-Dielectric Tunneling Field-Effect Transistors

A tunneling field-effect transistor (TFET) is considered one of the most promising alternatives to a metal-oxide-semiconductor field-effect transistor due to its immunity to short-channel effects. However, TFETs have suffered from low on-current, severe ambipolar behavior, and gradual transition bet...

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Veröffentlicht in:IEEE transactions on electron devices 2010-09, Vol.57 (9), p.2317-2319
Hauptverfasser: Choi, Woo Young, Lee, Woojun
Format: Artikel
Sprache:eng
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Zusammenfassung:A tunneling field-effect transistor (TFET) is considered one of the most promising alternatives to a metal-oxide-semiconductor field-effect transistor due to its immunity to short-channel effects. However, TFETs have suffered from low on-current, severe ambipolar behavior, and gradual transition between on- and off -states. To address those issues, the authors have proposed hetero-gate-dielectric TFETs. The proposed device enhances on-current, suppresses ambipolar behavior, and makes abrupt on-off transition by replacing the source-side gate insulator with a high- k material, which induces a local minimum of the conduction band edge at the tunneling junction.
ISSN:0018-9383
1557-9646
DOI:10.1109/TED.2010.2052167