Advances in Linear Modeling of Microwave Transistors
Heterojunction field effect transistors (HFET) based on gallium nitride (AlGaN/GaN) and metal semiconductor field effect transistors (MESFETs) based on silicon carbide (SiC) are the preferred transistors for high-power amplifier circuit designs rather than MESFETs, high electron mobility transistors...
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Veröffentlicht in: | IEEE microwave magazine 2009-04, Vol.10 (2), p.100, 102-111, 146 |
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Hauptverfasser: | , , , , , |
Format: | Magazinearticle |
Sprache: | eng |
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Zusammenfassung: | Heterojunction field effect transistors (HFET) based on gallium nitride (AlGaN/GaN) and metal semiconductor field effect transistors (MESFETs) based on silicon carbide (SiC) are the preferred transistors for high-power amplifier circuit designs rather than MESFETs, high electron mobility transistors (HEMTs) and pseudomorphic HEMTs based on gallium arsenide (GaAs) or indium phosphide (InP) semiconductor technology. While AlGaN/GaN and SiC are good candidates for high-power applications, GaAs and InP semiconductor technologies are the preferred transistors in low-power, low-voltage, and low-noise applications [1]. |
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ISSN: | 1527-3342 1557-9581 |
DOI: | 10.1109/MMM.2008.931675 |