High-Performance Thin-Film Lithium Niobate Mach-Zehnder Modulator on 8-inch Silicon Substrates

Lithium niobate modulators have primarily been fabricated on chip-level or 4/6-inch wafers. Here, thin-film lithium niobate (TFLN) electro-optic Mach-Zehnder modulators (MZM) are demonstrated for the first time on an 8-inch silicon substrate. The fabricated LN modulator has an on-chip loss of less t...

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Veröffentlicht in:IEEE photonics technology letters 2024-09, Vol.36 (17), p.1077-1080
Hauptverfasser: Zhou, Jingjie, Lv, Liming, Yao, Zhanshi, Zhu, Shiyang, Wang, Yuxi, Cong, Qingyu, Li, Zhaoyi, Fan, Zuowen, Zeng, Xianfeng, Hu, Ting, Jia, Lianxi
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Sprache:eng
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Zusammenfassung:Lithium niobate modulators have primarily been fabricated on chip-level or 4/6-inch wafers. Here, thin-film lithium niobate (TFLN) electro-optic Mach-Zehnder modulators (MZM) are demonstrated for the first time on an 8-inch silicon substrate. The fabricated LN modulator has an on-chip loss of less than 1 dB with a waveguide loss of lower than 0.5 dB/cm. The half-wave voltage- length product (V \pi \cdot L) is 3.12 V \cdot cm in the C-band at a 0.5 cm modulation length, and the corresponding 3-dB bandwidth of the electro-optic response is beyond 67 GHz. All specifications are state-of-the-art. These results provide the basis for the industrialization of the TFLN platform with better balance between performance and cost.
ISSN:1041-1135
1941-0174
DOI:10.1109/LPT.2024.3434542